用干涉光刻制作新型显示元件劳仑斯·里弗莫尔国家实验室的研究人员正用光干涉光刻而不用掩模制作微孔或微点列阵。这种形成微小组合区的微孔和微点可用来制作场致发射显示器（ＦＥＤ）。该室研究人员已证实此种工艺的工程可行性，正在考虑如何使这种技术商业化，以及如何... Making New Display Components with Interference Lithography Researchers at Lawrence Livermore National Laboratory are using light-interference lithography instead of masks to make micropores or micro-dot arrays. The micropores and micro-dots that form the microsite area can be used to make field emission displays (FEDs). Researchers in the room have demonstrated the engineering feasibility of this process and are considering how to commercialize the technology and how ...