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对Ti6Al4V进行以氮气为气源的无氢离子氮化工艺研究,氮化温度分别为700、750、800和900℃,保温时间4 h,通过金相检验、显微硬度测定和X射线衍射结构分析,研究了离子氮化温度等参数对渗层厚度、硬度和组织结构的影响规律。结果表明:温度是影响无氢离子氮化渗层厚度、硬度的主要因素,900℃的氮化层表面硬度达到897 HV,渗层厚度达到0.32 mm;氮化层由Ti2N(ε相)和TiN(δ相)组成。
The nitrogen-free nitridation of Ti6Al4V with nitrogen as the gas source was studied. The nitriding temperatures were 700, 750, 800 and 900 ℃, respectively. The holding time was 4 h. The microstructure, The influences of parameters such as ion nitriding temperature on the thickness, hardness and microstructure of the layer were analyzed and studied. The results show that the temperature is the main factor affecting the thickness and hardness of hydrogen-free nitriding layer. The surface hardness of the nitrided layer reaches 897 HV at 900 ℃ and the thickness of the infiltrated layer reaches 0.32 mm. The nitriding layer consists of Ti2N (ε phase) and TiN (δ phase).