由于容易对准促进了半透明光刻版的发展。然而,在它的发展和应用过程中,一些高质量标准已变得很明显,在重要性方面,可能超过对准设备。特别是,氧化铁薄膜已表明具有固有的低缺陷能级,提高了抗磨能力和钻蚀范围以及铬膜的反射率低。这样的标准将给掩膜制造者和使用者提供更大的工艺过程的控制。 Because of easy alignment to promote the development of translucent lithography. However, in the course of its development and application some of the high quality standards have become apparent and may outweigh the alignment of equipment in terms of importance. In particular, iron oxide films have been shown to have inherently low levels of defects, improved abrasion resistance and erosion coverage, and low reflectivity of the chromium film. Such standards will provide mask makers and users with greater process control.