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研究了燃焰法沉积金刚石薄膜的质量均匀性，指出反应气体流量比是影响金刚石薄膜质量均匀性的主要因素．基片表面沉积区径向温度梯度使金刚石薄膜晶粒尺寸随偏离沉积中心距离的增加而减小．
The quality uniformity of the diamond film deposited by combustion method was studied. It is pointed out that the flow ratio of reactive gas is the main factor affecting the quality uniformity of the diamond film. The radial temperature gradient in the deposition area of the substrate decreases the grain size of the diamond thin film as the distance from the deposition center increases.