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去年12月发布的ITRS2006修正版,基本未对主要版本ITRS2005做过多的修改。不过有一个例外就是增加双重图形作为潜在的45nm光刻解决方案(参见本刊《不改变光刻波长实现45nm半节距》一文)。
The revised ITRS 2006 release released last December basically did not make any major changes to the major version of ITRS2005. One exception, however, is the addition of dual graphics as a potential 45nm lithography solution (see our article “Changing the 45nm Half Pitch for Photolithographic Wavelengths”).