论文部分内容阅读
介绍了用离子束抛光法获得硅的超光滑表面的方法,并给出了不同抛光条件下表面粗糙度的原子力显微镜(AFM)测量结果,其中最好的表面粗糙度达0.12nm(有效值)。
The method for obtaining the ultra smooth surface of silicon by ion beam polishing is introduced. The results of atomic force microscopy (AFM) of the surface roughness under different polishing conditions are given. The best surface roughness is 0.12nm (effective value) .