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Kretschmann型激发表面等离子体共振(SPR)膜系结构是探针诱导表面等离子体共振耦合纳米光刻技术(PSPRN)的关键部分之一。采用多层介质的特性矩阵法计算膜系结构的透射系数和反射率,对PSPRN所需的单膜层、双膜层及三膜层膜系结构进行了优化设计。计算结果表明,光波波长为514.5 nm时,对于选定材料的最佳膜系结构是Ag膜厚度为46 nm的单膜层结构,Ag膜厚度为24 nm,AgOx厚度为95 nm的双膜层结构及Ag膜厚度为44 nm,SiO2厚度为180 nm,AgOx厚度为10 nm的三膜层结构,提出了记录层材料应选择折射系数小且吸收系数尽可能小的光刻材料的观点。
The Kretschmann-type excited surface plasmon resonance (SPR) membrane structure is one of the key components of the probe-induced surface plasmon resonance coupled nanolithography (PSPRN). The transmittance and reflectance of the film structure were calculated by using the property matrix method of multi-layer medium. The single, double and triple film structure of PSPRN was optimized. The calculated results show that the optimum film structure of the selected materials is a single film with Ag film thickness of 46 nm, a double film with Ag film thickness of 24 nm and AgOx with a thickness of 95 nm at a wavelength of 514.5 nm Structure and a three-layer structure with Ag film thickness of 44 nm, SiO 2 film thickness of 180 nm and AgOx thickness of 10 nm, a proposal is made that the recording layer material should have a small refractive index and a minimum absorption coefficient.