论文部分内容阅读
电子显微镜的发展对研究高聚物材料的形态结构提供了一种有力而方便的手段。为了提高图象观察的质量和真实反映材料结构的细节必须使材料的结构细节充分暴露出来。暴露材料结构的方法很多,其中以氩离子蚀刻法最简易可行。本文介绍了氩离子蚀刻技术处理刚性链和柔性链两类性质不同高聚物材料的试样,並用透射和扫描电子显微镜观察其形态结构。结果表明,在选择合适的蚀刻条件下,氩离子蚀刻法是高聚物材料电镜研究中的一种较为理想的制样技术。
The development of electron microscope provides a powerful and convenient method for studying the morphological structure of polymer materials. In order to improve the quality of the image observation and the true reflection of the details of the material structure, the structural details of the material must be fully exposed. There are many ways to expose the material structure, of which the most easy to use argon ion etching method. In this paper, argon ion etching is used to treat samples of two kinds of polymer materials with rigid chains and flexible chains. Morphology and structure are observed by transmission and scanning electron microscopy. The results show that argon plasma etching is an ideal sample preparation technique in the electron microscopy of polymer materials under the proper etching conditions.