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四种有机硅单体,即乙烯基三甲基硅烷(VTMS)、乙烯基甲基二乙基硅烷(VMDES)、八甲基环四硅氧烷(D_4)和六甲基二硅氧烷(M_2),在13.56MHz钟罩式等离子体发生器中,分别进行等离子体聚合,聚合物沉积在多孔聚丙烯底膜celgard 3401表面。在放电功率50W,体系压力12—30Pa,反应时间15—60min时,形成具有氧氮选择透过功能的有机硅等离子体聚合物复含膜。其氧气透过速率Jo_2是12.7—5.7×10~(-66)Cm~3(STP)/cm~2·s:cmHg,氧氮分离系数αO/N是3.78—4.07。等离子体聚合物层的厚度约0.1—0.2μm。根据它们的扫描电镜照片、红外光谱和元素分析数据,讨论了具有气体选择透过性能的等离子体聚合物复合膜的形反过程;底膜性质对复合膜性能的影响;等离子休聚合物层的化学结构和组成,以及它们同复杂等离子体聚合反应历程之间的关系
Four organosilicon monomers, namely vinyltrimethylsilane (VTMS), vinylmethyldiethylsilane (VMDES), octamethylcyclotetrasiloxane (D_4) and hexamethyldisiloxane M_2) were plasma polymerized respectively in a 13.56 MHz bell-type plasma generator, and the polymer was deposited on the surface of the porous polypropylene base film celgard 3401. When the discharge power is 50W, the system pressure is 12-30Pa, and the reaction time is 15-60min, a silicone plasma polymer complex membrane with selective oxygen and nitrogen transmission function is formed. The oxygen transmission rate Jo_2 is 12.7-5.7 × 10 ~ (-66) Cm ~ 3 (STP) / cm ~ 2 · s: cmHg, and the oxygen and nitrogen separation coefficient αO / N is 3.78-4.07. The thickness of the plasma polymer layer is about 0.1-0.2 μm. According to their scanning electron micrographs, infrared spectra and elemental analysis data, the inverse process of the plasma-polymer composite membrane with gas-selective permeability was discussed. The influence of the membrane properties on the performance of the composite membrane was discussed. Chemical Structure and Composition, and Their Relationship to Complex Polymerization Processes