在λ=285nm波长处，选择了一种新的多层膜材料对C／Al。与Mo／Si，C／Si软X射线多层膜相比，正入射C／Al多层膜在150nm附近有很低的二级衍射峰。用磁控溅射法制备了C／Al软X射线多层膜样品，并用X射线小角衍射法对其结构进行了测试。 At a wavelength of λ = 285 nm, a new multilayer film material to C / Al was chosen. Compared with the Mo / Si and C / Si soft X-ray multilayers, the positive incident C / Al multilayers have very low second-order diffraction peaks near 150 nm. The C / Al soft X-ray multilayer films were prepared by magnetron sputtering and their structures were tested by X-ray diffraction.