论文部分内容阅读
在390.60nm的紫外激光作用下,利用超声分子束技术与飞行时间（TOF）质谱仪相结合的方法研究了气相四甲基硅分子多光子电离（MPI）的TOF质谱,在较低能量的激光作用下主要检测到了Si（CH3）+、Si+、C2+等离子的信号,有时甚至只检测到了Si+离子的信号;在较高能量的激光作用下主要检测到了Si（CH3）+H（n=1,2,3,4）、Si+、C2+甚至还有SiC3+,SiC2+等离子的信号。据此并结合以前得到的结论,讨论了四甲基硅分子可能的MPI过程。得出了Si+主要来自于Si（CH3）4的多光子解离-Si原子的（1+1）电离,Si（CH3）+H（n-1,2,3）主要来自于Si（CH3）H（n=1,2,3）的（3+1）电离、Si（CH3）+4来自于Si（CH3）4的（3+1）电离的结论。
The TOF mass spectra of gas-phase tetramethylsilver multi-photon ionization (MPI) were studied by the combination of ultrasonic molecular beam technique and time of flight (TOF) mass spectrometer under the action of UV laser at 390.60 nm. In the low energy laser The signals of Si (CH3) +, Si + and C2 + ions were detected mainly by the action of Si3 +, and only the signals of Si + ions were detected at the same time. Si (CH3) + H was mainly detected under the action of higher energy laser (n = 2,3,4), Si +, C2 + and even SiC3 +, SiC2 + plasma signals. Based on this and in combination with the previous conclusions, the possible MPI processes of tetramethylsilyl molecules are discussed. The (1 + 1) ionization of multi-photon dissociation -Si atoms of Si + mainly from Si (CH 3) 4 was obtained. Si (CH 3) + H (3 + 1) ionization of H (n = 1,2,3), and the conclusion that Si (CH3) +4 comes from the (3 + 1) ionization of Si (CH3) 4.