磁控溅射法制备钛掺杂WO3薄膜结构和性能的研究

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采用中频孪生非平衡磁控溅射技术制备钛掺杂WO_3薄膜。运用X射线衍射(XRD),拉曼光谱、紫外分光光度计、计时安培分析仪和原子力显微镜(AFM)等测试手段分析了钛掺杂WO_3薄膜的结构和光学性能。实验结果表明,掺杂后的薄膜在相同的热处理条件下晶化程度降低,晶粒细化,离子抽出和注入的通道大大增多,钛掺杂原子数分数0.051的着色响应速度提高,循环寿命提高了4倍以上,但着色后透射率下降。 Titanium doping WO_3 thin films were prepared by IF twin magnetron sputtering. The structure and optical properties of Ti-doped WO_3 thin films were analyzed by X-ray diffraction (XRD), Raman spectroscopy, UV spectrophotometer, chronoamperometry and atomic force microscopy (AFM) The experimental results show that the crystallinity of doped films decreases under the same heat treatment conditions, and the channels of grain refinement, ion extraction and injection greatly increase. The coloring reaction speed of titanium doping atom number 0.051 increases, Life expectancy increased more than 4 times, but the transmittance decreased after coloring.
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