本文介绍新近研制成功的作为电子束曝光用的激光定位干涉系统.文章介绍了光学系统,光路计算结果,并阐述了利用检偏器调节干涉条纹相位的新方法,其定位精度为±0.04μm. In this paper, the newly developed laser positioning interferometry system for electron beam exposure is introduced.The optical system and the calculation results of the optical path are introduced.The new method of adjusting the phase of the interference fringes with the analyzer is also described. The positioning accuracy is ± 0.04μm.