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用电子束蒸发技术在K9玻璃及YAG晶体上沉积了HfO2/SiO2多层膜,采用纳米划痕仪对薄膜的力学性能进行了研究。实验结果表明:沉积在YAG和K9的多层膜弹性模量分别为34.8GPa和38.5GPa,基底对薄膜的弹性模量影响较小;YAG和K9上薄膜的粘附失效临界附着力分别为5mN和7mN,薄膜与YAG基底的结合状态较K9基底的差,并且呈现不同破坏模式。从薄膜之间及膜基界面处的界面结合状态和弹性模量两方面分析解释了YAG基底和K9基底上薄膜的不同力学行为。
HfO2 / SiO2 multilayers were deposited on K9 glass and YAG by electron beam evaporation, and the mechanical properties of the films were investigated by nano-scratch tester. The experimental results show that the elastic modulus of the multilayers deposited on YAG and K9 are 34.8GPa and 38.5GPa, respectively. The base has little effect on the elastic modulus of the films. The critical adhesion of YAG and K9 films is 5mN And 7mN, the bonding state between the film and the YAG substrate is worse than that of the K9 substrate, and shows different failure modes. The different mechanical behaviors of YAG and K9 films were analyzed from two aspects: interface bonding state and elastic modulus between the films and between the films.