半导体的化学刻蚀,俗称湿法刻蚀,它是半导体器件制作中的一个重要工艺,按照化学作用的原理,它可分为化学反应刻蚀、电化学刻蚀和光电化学刻蚀,半导体的化学刻蚀是在众多刻蚀方法中最基本和最终不能全部被取代的一种方法,它在高新技术中有着各种特殊的用途,如选择准刻蚀、各向异性刻蚀和计算机控制无掩模刻蚀等。 Semiconductor chemical etching, commonly known as wet etching, which is an important process in the manufacture of semiconductor devices, according to the principle of chemical action, which can be divided into chemical reaction etching, electrochemical etching and photoelectrochemical etching, semiconductor Chemical etching is one of the most basic and in the end can not be replaced by many etching methods, it has a variety of special applications in high-tech, such as the choice of quasi-etching, anisotropic etching and computer-controlled Mask etched.