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离子注入工艺应用于制备半导体器件的优越性及其巨大的经济意义已是众所周知的了。近几年来,英、美等先进国家又将这一工艺技术扩展应用到金属和其他材料方面。特别是在1978年匈牙利召开的第一届离子束材料改性国际会议上(IBMM)普遍认为用离子束工艺能进一步改进金属和其他材料表面的抗磨损性能和抗氧化腐蚀性能。英国哈威尔原子能研究所G.Dearnaley等宣布:经他们研究小组七年的努力,已经成功地用离子注入工艺处理了某些工业用的工件和
It is well-known that the advantages of ion implantation processes for fabricating semiconductor devices and their enormous economic implications. In recent years, advanced countries such as Britain and the United States have extended the application of this technology to metals and other materials. In particular, the first International Conference on Ion Beam Material Modification (IBMM), held in Hungary in 1978, was generally considered to be able to further improve the abrasion and oxidation resistance properties of metal and other material surfaces with ion beam technology. G. Decarnaley et al., Harvard Atomic Energy Research Institute, UK, announce that, after seven years of efforts by their research team, they have successfully used ion implantation processes for certain industrial applications and