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我们应用的各种制版、光刻设备,其目的不外乎将各种掩模图形复制到基片上去。其常用的复制方法,我国目前仍采用光学曝光。无视这一技术对微细图形复印的影响,羌论在国外、国内已经多年了。随着硅片尺寸的不断增大,单元图形尺寸的减小,人们不能不对常规曝光系统进行改革。我们从1976年着手研制新型的曝光系统,并在兄弟厂、所的协助下先后开展了一些工艺实验。这种新型的曝光系统,目前已用于GK—4型光刻机和复印机。
We use a variety of plate making, lithography equipment, its purpose is nothing more than a variety of mask patterns copied to the substrate. The commonly used method of copying, our country is still using optical exposure. Ignoring this technology on the impact of fine graphics copy, Qiang theory in foreign countries, China has been for many years. With the increasing size of the silicon, cell size reduction, people can not but reform the conventional exposure system. We started in 1976 to develop a new type of exposure system, and in the brother factory, has been carried out with the help of a number of technology experiments. This new type of exposure system, currently used in GK-4 lithography and copiers.