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相对于传统化学机械抛光(CMP)技术存在的磨料浪费和抛光液污染环境等问题,一种以海藻酸钠(SA)水凝胶为基体的纳米磨料抛光工具开始展现其潜在的应用前景和环保优势.为了解决凝胶干燥成膜过程中基体严重收缩导致的磨料层很薄以及储存过程中基体继续失水引起的工具表面干裂失效等问题,采用了向基体中添加干燥控制化学添加剂(DCCA)的方法;并通过正交实验和极差分析,分析了不同DCCA对基体收缩的影响程度,选择了最佳的添加剂浓度配比.最后通过硅片抛光试验,对改良后的工具加工性能进行了检验.试验结果表明,向基体中添加质量分数为4%的纳米二氧化硅、12%的蔗糖和0.14%的十二烷基硫酸钠(SDS)对基体收缩的抑制效果最明显,磨料层的厚度提高了1.7倍,且在储存过程中不再出现明显的脱水失效.同时,该工具的基体变成了疏松多孔的结构,进而提高了工具的加工性能.
Compared with the traditional chemical mechanical polishing (CMP) technology, such as the existence of abrasive waste and polluting the environment polluting and so on, a sodium alginate (SA) hydrogel-based nano-abrasive polishing tools began to show its potential applications and environmental protection Advantages: In order to solve the problems of thinner abrasive layer caused by severe shrinkage of substrate during gel-drying process and failure of surface of tool on dry surface during storage, DCCA was added to the matrix, The influence of different DCCA on the shrinkage of the matrix was analyzed by orthogonal experiment and range analysis, and the best ratio of additive concentration was selected.At last, the processing performance of the improved tool was tested by silicon wafer polishing test Test.The results showed that adding nano-silica with 4% mass fraction, 12% sucrose and 0.14% sodium dodecyl sulfate (SDS) to the matrix exhibited the most obvious inhibition effect on the shrinkage of the matrix, The thickness increased by 1.7 times, and no obvious dehydration failure occurred in the storage process.At the same time, the tool’s matrix became porous and porous structure, which increased the tool’s plus Work performance.