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Five fluorine-containing vinyl ether monomers were prepared by the reaction between 2-vinyloxy ethanol, a fluorinated alcohol and hexafluorobenzene in the presence of sodium hydride in dimethylformamide. Two representative properties of these monomers, UV-curing behavior initiated by a cationic photo-initiator PAG 201 and surface free energy of coating films, were investigated. Photo-polymerization proceeded both rapidly and completely with a high double-bond conversion(> 90%) and a fast curing rate(maximum curing time < 21 s) for three monomers. The surface energies of the monomers and the resulting polymer films were then investigated. The minimum surface free energy of the UV-cured homopolymer films reaches 7.1 mJ/m2. X-ray photoelectron spectroscopy data show that the low surface tension is influenced by fluorine content in the soft segments and fluorinated chains’ migration to the surface. The five monomers exhibit low viscosity, low surface energy, good thermal stability and good photo-polymerization properties, which make them great candidates for UV coating and photoresist applications.
Five fluorine-containing vinyl ether monomers were prepared by the reaction between 2-vinyloxy ethanol, a fluorinated alcohol and hexafluorobenzene in the presence of sodium hydride in dimethylformamide. Two representative properties of these monomers, UV-curing behavior initiated by a cationic photo-initiator PAG 201 and surface free energy of coating films, were investigated. Photo-polymerization proceeded both rapidly and completely with a high double-bond conversion (> 90%) and a fast curing rate (maximum curing time <21 s) for three monomers. The surface energies of the monomers and the resulting polymer films were then investigated. The minimum surface free energy of the UV-cured homopolymer films reaches 7.1 mJ / m2. X-ray photoelectron spectroscopy data show that the low surface tension is influenced by content in the soft segments and fluorinated chains’ migration to the surface. The five monomers exhibit low viscosity, low surface energy, good thermal stability and good photo-polymerization properties, which make them great candidates for UV coatings and photoresist applications.