采用电沉积技术 ,通过将铋沉积到氧化铝多孔膜的纳米级微孔内 ,制备铋纳米线阵列材料 .实验发现 ,温度对电沉积过程有显著影响 ,镀液中铋以简单 Bi3+离子形式存在有助于金属铋沉积到氧化铝多孔膜的纳米级微孔内 .由于 Bi3+离子在氧化铝模板的纳米级微孔内扩散困难 ,故采取脉冲电沉积工艺 .XRD分析显示 ,通过电沉积工艺制备出了 Bi纳米线材料 The bismuth nanowire arrays were prepared by electrodeposition deposition of bismuth into nano-scale pores of alumina porous film. It was found that the temperature had a significant effect on the electrodeposition process. The bismuth existed as simple Bi3 + ions in the bath Which helps to deposit the metal bismuth into the nano-scale pores of the alumina porous membrane.Because the Bi3 + ions are difficult to diffuse in the nano-scale pores of the alumina template, the pulse electrodeposition process is adopted.XRD analysis shows that the electrodeposition process Bi Bi wire material out