采用阴极磁控溅射法制备用于电磁屏蔽的 ITO透明导电膜 ,方块电阻在 5～ 40 Ω/□范围内。测试不同方块电阻膜层的电阻率、膜厚、可见光透光度、雾度、对 8～ 18GHZ频率范围内电磁波的反射率等性能 ,通过 X射线衍射图谱和 X射线回摆曲线研究膜层的结晶程度和晶粒大小对膜层性能的影响 ,引入特性优化因子来综合评价膜层的性能 The ITO transparent conductive film for electromagnetic shielding was prepared by cathodic magnetron sputtering, and the sheet resistance was in the range of 5~40 Ω / □. The resistivity, film thickness, visible light transmittance and haze of the different square resistive films were measured. The reflectance of the electromagnetic wave in the frequency range of 8 ~ 18GHz was tested. The properties of the films were studied by X-ray diffraction and X-ray Degree of crystallization and grain size on the performance of the film, the introduction of the characteristics of the optimization factor to evaluate the performance of the film