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Grimm辉光放电灯已被用于发射光谱逐层分析。由于样品成份随深度急剧变化,很难找到成份与其相近的标准来标定元素含量,有时只给出了定性结果。本文提出了一种新的标定方法。我们用辉光放电和原子发射光谱的基本理论分析了辉光灯中的溅射和激发过程。在固定放电电压和气压的条件下,得到了一个新的标定公式: I=K(gAC) 式中I、C、g、A分别是分析元素谱线强度,溅射表面该元素的含量,溅射率和放电电流,K是个与其它元素的存在无关的比例系数。g和A都会因样品成份不同而有差别,这说明它们代表了样品中的基体和共存元素影响。但是它们可以在实验中测量。这样就可以用纯金属或不同基体的合金作为标准来标定被测样品溅射表面的元素含量,进行逐层定量分析。当用摄谱法时,相应的公式为: S=γlog(gACt)+k 式中S,γ,t分别代表谱线黑度,干板反衬度和暴光时间。
Grimm glow discharge lamps have been used for emission spectroscopy layer by layer analysis. Due to sharp changes in the depth of the sample composition, it is difficult to find the composition of similar standards to calibrate the elemental content, and sometimes only give a qualitative result. This paper presents a new calibration method. We used the basic theory of glow discharge and atomic emission spectroscopy to analyze the sputtering and excitation processes in a glow lamp. Under the condition of fixed discharge voltage and air pressure, a new calibration formula is obtained: I = K (gAC) where I, C, g and A are the intensity of the analytical element line, the content of the element on the sputtering surface, Emissivity and discharge current, K is a scale factor that is independent of the presence of other elements. Both g and A will differ depending on the sample composition, indicating that they represent the matrix and coexisting elements in the sample. But they can be measured experimentally. This allows the use of pure metals or alloys of different substrates as a standard to calibrate the elemental content of the sputtered surface of the sample under test for quantitative layer-by-layer analysis. When using the spectrometry, the corresponding formula is: S = γlog (gACt) + k Where S, γ, t represent the black line, dry plate contrast and exposure time.