During sintering process of diamond tools, metal bond containing graphitizing elements such as Fe, Co, Ni seriously erodes diamond grits, which reduces the strength of the diamond grits. In this paper, silicon films were coated on the surface of diamond grits by means of atomic layer deposition (ALD) from gaseous SiH4. Fourier transform infrared (FTIR) spectra, X-ray diffraction (XRD) and Atomic force microscopy (AFM) were utilized to analyze the structure and the morphology of Si-coated diamond respectively. The results suggested thatthe film was cubic-phase polycrystalline silicon and the surface of the film was smooth and continuous. According with the adsorption mechanism of SiH4 on the surface of diamond grits, the stretching and bending modes of SiH2 and SiH3 both existed. Differential thermal analysis (DTA) was used to compare the thermal stability of coated diamond and uncoated diamond. Owning to the protection of silicon films the starting oxidation temperature of coated diamond reached as high as 920℃, which was much higher than that of uncoated diamond. Bending experiment was conducted to measure the bending strength of Fe-Cu-Sn-Ni based metal bond diamond blade. In comparison with uncoated diamond, the bending strength of Sicoated diamond blade increased by 16.2%, scan electron microscope (SEM) observation of the blade fracture revealed that the deposited silicon films not only protected the diamond grits from erosion during sintering process but also realized the strong binding between the diamond grits and the bond.